The GD-Profiler 2 provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.
Equipped with an RF source that can operate in pulse mode for fragile samples, the range of applications of the GD-Profiler 2 goes from corrosion studies to PVD coating process control and it is used in universities as well as in routine metal and alloys production plants.
The GD-Profiler HR gives the optimum in terms of resolution and number of elements to solve analytical problems even in the most complex matrices.
Benefits:
- RF-Only generator is Class E standard and optimized for stability and crater shape allowing for real surface analysis;
- Source can be pulsed with synchronized acquisition for optimum results on fragile samples. The use of an RF source allows analysis of conventional and non conventional layers and materials;
- Simultaneous optic provides full spectral coverage from 110 to 800nm, including deep UV access to analyze H, O, C, N and Cl;
- HORIBA original, ion-etched holographic gratings assure the highest light throughput for maximum light efficiency and sensitivity;
- Patented HDD detection provides speed and sensitivity in detection without compromise;
- Easily accessible sample compartment allows plenty of room for sample loading;
- Powerful QUANTUM software with Tabler report writing tool;
- CenterLite laser pointer (patent pending) for precise sample loading;
- Monochromator option available only from HORIBA provides the perfect tool to increase instrument flexibility while adding "n+1" capability.
Parameters | Value |
Profiler 2 | Profiler HR |
Spectral range |
110–900 nm |
Optical resolution |
18–25 pm |
7–14 pm |
Polychromator focal length
|
50 cm |
100 cm |
Monochromator (option)
|
64 cm |
100 cm |
Detection |
HDD, photomultiplier detector with automatic gain adjustment |
Sensitivity |
1–10 ppm for most elements |
0,5–10 ppm for most elements |
Number of channels |
45 |
58 |
Analysis rate |
1–5 µm per minute |
Analysis depth |
from 150–200 µm |
Pulsed RF source |
Standard equipment |
Trace gas analysis (C, H, N, O) |
Yes |
Analysis of non-conductive and brittle samples |
Yes, with pulsed GD source |
Standard anode |
4 mm |
Additional anodes |
2, 7, 8 mm |
Software language |
Multilanguage Software |